Plasmon–phonon gain in CdHgTe structures with near-surface HgTe quantum wells

Abstract The work is devoted to the study of plasmon–phonon gain in CdHgTe/HgTe structures with quantum wells (QWs) located near the boundary of the structure with vacuum/air (near-surface QWs). The issue of the influence of the distance between QWs on the plasmon–phonon gain has been studied. It has been shown that a decrease in the distance from the nearest QW to the structure boundary leads to an increase in the phase velocity of the generated plasmon–phonon and a decrease in the power absorbed by phonons in the barriers. This leads to a decrease in the threshold concentration of nonequilibrium carriers required to begin of plasmon–phonon gain under conditions of optical excitation.

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Publication Details

Journal
Journal of Optics
Published
2024-08-13
DOI
https://doi.org/10.1088/2040-8986/ad6e9c
Primary Topic
Advanced Semiconductor Detectors and Materials
Type
article
Field-Weighted Citation Impact
0.00

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article

Plasmon–phonon gain in CdHgTe structures with near-surface HgTe quantum wells

V. Ya. Aleshkin, A. O. Rudakov, А. А. Дубинов, S. V. Morozov
Journal of Optics
Advanced Semiconductor Detectors and Materials
article

Plasmon–phonon gain in CdHgTe structures with near-surface HgTe quantum wells

V. Ya. Aleshkin, A. O. Rudakov, А. А. Дубинов, S. V. Morozov
article en

Abstract

Abstract The work is devoted to the study of plasmon–phonon gain in CdHgTe/HgTe structures with quantum wells (QWs) located near the boundary of the structure with vacuum/air (near-surface QWs). The issue of the influence of the distance between QWs on the plasmon–phonon gain has been studied. It has been shown that a decrease in the distance from the nearest QW to the structure boundary leads to an increase in the phase velocity of the generated plasmon–phonon and a decrease in the power absorbed by phonons in the barriers. This leads to a decrease in the threshold concentration of nonequilibrium carriers required to begin of plasmon–phonon gain under conditions of optical excitation.

Journal of OpticsVol. 26(10)
Institute for Physics of Microstructures (RU), N. I. Lobachevsky State University of Nizhny Novgorod (RU), Ioffe Institute (RU)
Russian Science Foundation
Openalex Percentile: Top 90%
Advanced Semiconductor Detectors and Materials
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