GaN Surface Passivation by MoS<sub>2</sub> Coating

In this study, we investigate the impact of two-dimensional MoS<sub>2</sub> coating on the optical properties of surface GaN/AlGaN quantum wells (QWs). A strong enhancement in GaN QW light emission is observed with monolayer-MoS<sub>2</sub> coating, yielding luminescence intensity comparable to that from a QW capped by an AlGaN barrier. Our results demonstrate that MoS<sub>2</sub>, despite its quite different nature from III-nitride semiconductors, acts as an effective barrier for surface GaN QWs and suppresses spatially localized intrinsic surface states. This finding provides novel pathways for efficient III-nitride surface passivation.

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Publication Details

Journal
Nano Letters
Published
2024-08-12
DOI
https://doi.org/10.1021/acs.nanolett.4c02259
Citations
4
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.24

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GaN Surface Passivation by MoS2 Coating

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GaN-based semiconductor devices and materials
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article

GaN Surface Passivation by MoS2 Coating

Danxuan Chen, J.‐F. Carlin, Thomas F. K. Weatherley, N. Grandjean, Mitali Banerjee, Jin Jiang
article en
4 citations

Abstract

In this study, we investigate the impact of two-dimensional MoS<sub>2</sub> coating on the optical properties of surface GaN/AlGaN quantum wells (QWs). A strong enhancement in GaN QW light emission is observed with monolayer-MoS<sub>2</sub> coating, yielding luminescence intensity comparable to that from a QW capped by an AlGaN barrier. Our results demonstrate that MoS<sub>2</sub>, despite its quite different nature from III-nitride semiconductors, acts as an effective barrier for surface GaN QWs and suppresses spatially localized intrinsic surface states. This finding provides novel pathways for efficient III-nitride surface passivation.

Nano LettersVol. 24(33)
École Polytechnique Fédérale de Lausanne (CH)
Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung, Horizon 2020 Framework Programme
Openalex Percentile: Top 22%
GaN-based semiconductor devices and materials
1.24
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