A Study on High Performance, Dual-Gate a-IZO/a-IGZTO TFTs With Excellent Stability

We report a high-performance dual-gate, dual-sweep (DS) a-IZO/a-IGZTO TFT with high field-effect mobility (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu _{\text {FE}}\text {)}$ </tex-math></inline-formula> of 65 cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>/V.s, threshold voltage (V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {TH}}\text {)}$ </tex-math></inline-formula> of 0.4V, subthreshold swing (SS) of 0.23 V/dec and high on/off current ratio of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{{7}}$ </tex-math></inline-formula>. A systematic study on the bias stress effect has been carried out by making accumulation or depletion at the interface with bottom gate (BG) or top gate (TG) bias. Technology computer-aided design (TCAD) simulation results fitted well with measurement data using the density of states for a-IZO and a-IGZTO. Positive-bias temperature stability tests were conducted at 60°C for 1 hr using a +20V stress voltage, based on the V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub>, showed negligible V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub> shift for all bias stress cases. These results suggest that the a-IZO/a-IGZTO TFT, with its high mobility with excellent stability, could be suitable for large area AMOLED displays.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-08-12
DOI
https://doi.org/10.1109/led.2024.3442152
Citations
10
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
2.09

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article

A Study on High Performance, Dual-Gate a-IZO/a-IGZTO TFTs With Excellent Stability

MD Redowan Mahmud Arnob, Jin Jang, Dong Kil Yim, Abidur Rahaman et al.
10 citations
IEEE Electron Device Letters
Thin-Film Transistor Technologies
2.09
article

A Study on High Performance, Dual-Gate a-IZO/a-IGZTO TFTs With Excellent Stability

MD Redowan Mahmud Arnob, Jin Jang, Dong Kil Yim, Abidur Rahaman, You-Ron Lin, Milan Pešić, Mohammad Masum Billah, Soo Young Choi, Sunaina Priyadarshi, Bastien Beltrando, Yang Ho Bae, Juergen Grillmayer, C. Ma, Berlin Chen, Lynn Yang, Zero Hung, Jung Bae Kim, Sabiqun Nahar
article en
10 citations

Abstract

We report a high-performance dual-gate, dual-sweep (DS) a-IZO/a-IGZTO TFT with high field-effect mobility (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu _{\text {FE}}\text {)}$ </tex-math></inline-formula> of 65 cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>/V.s, threshold voltage (V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {TH}}\text {)}$ </tex-math></inline-formula> of 0.4V, subthreshold swing (SS) of 0.23 V/dec and high on/off current ratio of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{{7}}$ </tex-math></inline-formula>. A systematic study on the bias stress effect has been carried out by making accumulation or depletion at the interface with bottom gate (BG) or top gate (TG) bias. Technology computer-aided design (TCAD) simulation results fitted well with measurement data using the density of states for a-IZO and a-IGZTO. Positive-bias temperature stability tests were conducted at 60°C for 1 hr using a +20V stress voltage, based on the V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub>, showed negligible V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub> shift for all bias stress cases. These results suggest that the a-IZO/a-IGZTO TFT, with its high mobility with excellent stability, could be suitable for large area AMOLED displays.

IEEE Electron Device LettersVol. 45(10)
Applied Materials (United States) (US), Kyung Hee University (KR), Islamic University of Technology (BD)
Citrus Research and Development Foundation
Affordable and clean energy
Openalex Percentile: Top 13%
Thin-Film Transistor Technologies
2.09
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