A Study on High Performance, Dual-Gate a-IZO/a-IGZTO TFTs With Excellent Stability
We report a high-performance dual-gate, dual-sweep (DS) a-IZO/a-IGZTO TFT with high field-effect mobility (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu _{\text {FE}}\text {)}$ </tex-math></inline-formula> of 65 cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>/V.s, threshold voltage (V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {TH}}\text {)}$ </tex-math></inline-formula> of 0.4V, subthreshold swing (SS) of 0.23 V/dec and high on/off current ratio of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{{7}}$ </tex-math></inline-formula>. A systematic study on the bias stress effect has been carried out by making accumulation or depletion at the interface with bottom gate (BG) or top gate (TG) bias. Technology computer-aided design (TCAD) simulation results fitted well with measurement data using the density of states for a-IZO and a-IGZTO. Positive-bias temperature stability tests were conducted at 60°C for 1 hr using a +20V stress voltage, based on the V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub>, showed negligible V<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</sub> shift for all bias stress cases. These results suggest that the a-IZO/a-IGZTO TFT, with its high mobility with excellent stability, could be suitable for large area AMOLED displays.
Authors
- MD Redowan Mahmud Arnob
- Jin Jang (ORCID: https://orcid.org/0000-0002-7572-5669)
- Dong Kil Yim
- Abidur Rahaman (ORCID: https://orcid.org/0000-0002-9100-4204)
- You-Ron Lin (ORCID: https://orcid.org/0000-0002-1759-7419)
- Milan Pešić (ORCID: https://orcid.org/0000-0002-1788-8945)
- Mohammad Masum Billah (ORCID: https://orcid.org/0000-0001-7895-5948)
- Soo Young Choi (ORCID: https://orcid.org/0000-0002-4424-6729)
- Sunaina Priyadarshi (ORCID: https://orcid.org/0000-0003-2521-2379)
- Bastien Beltrando
- Yang Ho Bae
- Juergen Grillmayer
- C. Ma
- Berlin Chen
- Lynn Yang
- Zero Hung
- Jung Bae Kim
- Sabiqun Nahar (ORCID: https://orcid.org/0000-0002-0251-6794)
Institutions
- Applied Materials (United States) (US)
- Kyung Hee University (KR)
- Islamic University of Technology (BD)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-08-12
- DOI
- https://doi.org/10.1109/led.2024.3442152
- Citations
- 10
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 2.09
Funders
- Citrus Research and Development Foundation