ON POSSIBILITY OF DRAIN OF DOPANT IN A MULTILAYER STRUCTURE TO INCREASE HOMOGENEITY OF DISTRIBUTION OF THE DOPANT’S CONCENTRATION
In this paper, we introduce an approach to increase homogeneity of distribution of implanted dopant in enriched area due to organization of drains. Also we introduce a model and analytical approach for analysis of the considered technological process in multilayer structures with account variation in time parameters of the process and nonlinearity of mass transport. Received: May 21, 2024;Accepted: June 10, 2024
Authors
- E. L. Pankratov (ORCID: https://orcid.org/0000-0001-6174-2612)
Publication Details
- Journal
- International Journal of Materials Engineering and Technology
- Published
- 2024-08-05
- DOI
- https://doi.org/10.17654/0975044424005
- Primary Topic
- Electric Power Systems and Control
- Type
- article
- Field-Weighted Citation Impact
- 0.00