Electric Double Layer Transistors Based on 2-D Electron Gases Operated at a Low Voltage for Synaptic Devices
Low-voltage-operated electric double layer transistor (EDLT) for synaptic devices are fabricated by leveraging the 2-D electron gases (2DEGs) formed at interfaces LaAlO3/KTaO3 (LAO/KTO) and LAO/SrTiO3 (STO) at room temperature (RT). The EDLT devices demonstrate promising characteristics, including a high ON/OFF-state current ratio of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.0\times 10^{{6}}$ </tex-math></inline-formula> and a low subthreshold swing (SS) of 138.9 mV/dec upon a low sweeping gate voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\text {g}}$ </tex-math></inline-formula>) from -1 to 2.5 V. The characteristics are comparable to those of 2DEGs-based field-effect transistors prepared at higher temperatures (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\ge 500~^{\circ }$ </tex-math></inline-formula> C). By harnessing the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\text {g}}$ </tex-math></inline-formula>-induced ions migration, we successfully develop the 2DEGs-based synaptic device capable of emulating neuromorphic features, including paired-pulse facilitation and filtering functionality. This research not only expands the range of room-temperature applications for 2DEGs in field-effect transistors (FETs), but also presents a viable approach to design 2DEGs-based synaptic devices for neuromorphic computing.
Authors
- Zhongqiang Chen (ORCID: https://orcid.org/0000-0003-4423-4995)
- Guozhong Xing (ORCID: https://orcid.org/0000-0002-0618-1960)
- Ruijie Xu (ORCID: https://orcid.org/0009-0008-6643-1459)
- Long Liu (ORCID: https://orcid.org/0000-0002-0598-266X)
- Xu Zhang (ORCID: https://orcid.org/0000-0002-1882-736X)
- Rong Zhang (ORCID: https://orcid.org/0000-0003-0015-6331)
- Xuefeng Wang (ORCID: https://orcid.org/0000-0002-3472-7895)
- Yixin Zhu (ORCID: https://orcid.org/0000-0003-3319-2961)
- Qing Wan (ORCID: https://orcid.org/0000-0003-4588-7592)
- Chong Zhang (ORCID: https://orcid.org/0009-0007-4786-9888)
- Li Zhu (ORCID: https://orcid.org/0009-0009-0607-1225)
Institutions
- Chinese Academy of Sciences (CN)
- Nanjing University of Posts and Telecommunications (CN)
- Institute of Microelectronics (CN)
- Collaborative Innovation Center of Advanced Microstructures (CN)
- Nanjing University (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2024-08-05
- DOI
- https://doi.org/10.1109/ted.2024.3435180
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.21
Funders
- National Natural Science Foundation of China